{"created":"2023-06-20T14:21:09.673528+00:00","id":1002,"links":{},"metadata":{"_buckets":{"deposit":"4f1ca954-062a-4095-ab74-bd73a3b4d36c"},"_deposit":{"created_by":3,"id":"1002","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"1002"},"status":"published"},"_oai":{"id":"oai:aue.repo.nii.ac.jp:00001002","sets":["6:112:128"]},"author_link":["25","1171"],"item_3_alternative_title_1":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Formation and Characterization of Oxide Films Anodically Grown on Si Surface"}]},"item_3_biblio_info_7":{"attribute_name":"書誌事項","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2001-03-01","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"91","bibliographicPageStart":"83","bibliographicVolumeNumber":"50","bibliographic_titles":[{"bibliographic_title":"愛知教育大学研究報告. 芸術・保健体育・家政・技術科学・創作編"}]}]},"item_3_description_27":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_3_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"An anodic oxidation on Si surface has been tried in order to gain information for the anodic oxidation on SiC which has been attracted a great deal of attention as a semiconductor material for operating devices at high temperature in near future. In this paper the anodic oxidation on Si surface has been investigated by systematically changing the pH values of electrolyte and electric current. The anodic oxide films have been characterized by ellipsometric and infrared absorption studies. High quality anodic oxide film on Si was formed at pH values of 9.00 and 5.95 in the electrolyte of NH_4OH solution.","subitem_description_type":"Abstract"}]},"item_3_link_3":{"attribute_name":"研究者総覧へのリンク","attribute_value_mlt":[{"subitem_link_text":"清水, 秀己","subitem_link_url":"https://souran.aichi-edu.ac.jp/person/698d51a19d8a121ce581499d7b701668ja.html"}]},"item_3_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"愛知教育大学"}]},"item_3_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11528269","subitem_source_identifier_type":"NCID"}]},"item_3_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1346-1818","subitem_source_identifier_type":"ISSN"}]},"item_3_text_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"subitem_text_value":"愛知教育大学研究報告, 芸術・保健体育・家政・技術科学・創作編. 2001, 50, p.83-91."}]},"item_3_text_26":{"attribute_name":"著者別名","attribute_value_mlt":[{"subitem_text_value":"シミズ, ヒデキ"},{"subitem_text_value":"キシ, ワカト"}]},"item_3_text_4":{"attribute_name":"著者(別言語)","attribute_value_mlt":[{"subitem_text_value":"Shimizu, Hideki"},{"subitem_text_value":"Kishi, Wakato"}]},"item_3_version_type_14":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"清水, 秀己"}],"nameIdentifiers":[{},{},{}]},{"creatorNames":[{"creatorName":"岸, 稚人"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-03-27"}],"displaytype":"detail","filename":"kengei508391.pdf","filesize":[{"value":"277.5 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kengei508391.pdf","url":"https://aue.repo.nii.ac.jp/record/1002/files/kengei508391.pdf"},"version_id":"7511aa37-5285-4486-97c7-e1e1ae49965e"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"陽極酸化","subitem_subject_scheme":"Other"},{"subitem_subject":"Anodic Oxidation","subitem_subject_scheme":"Other"},{"subitem_subject":"シリコン","subitem_subject_scheme":"Other"},{"subitem_subject":"Silicon","subitem_subject_scheme":"Other"},{"subitem_subject":"偏光解析","subitem_subject_scheme":"Other"},{"subitem_subject":"Ellipsometry","subitem_subject_scheme":"Other"},{"subitem_subject":"赤外吸収スペクトル","subitem_subject_scheme":"Other"},{"subitem_subject":"Infrared Absorption Spectrum","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"陽極酸化によるシリコン表面上への酸化膜の形成と評価","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"陽極酸化によるシリコン表面上への酸化膜の形成と評価"}]},"item_type_id":"3","owner":"3","path":["128"],"pubdate":{"attribute_name":"公開日","attribute_value":"2008-12-04"},"publish_date":"2008-12-04","publish_status":"0","recid":"1002","relation_version_is_last":true,"title":["陽極酸化によるシリコン表面上への酸化膜の形成と評価"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-06-20T15:27:32.399100+00:00"}